Plasma surface processing 1
23 September 2025
PSURF
•
PSURF 1
•
15:00
>
16:00
•
Plasma surface processing 1
•
Ella Fitzgerald room
PSURF
15:00
•
PSURF1-O1-075
•
Dry etch process development of gapless silicon nitride microlens array for CMOS imager sensors
>
A.
Aurélien
TAVERNIER (Grenoble)
15:20
•
PSURF1-O2-104
•
Development of plasma ALE for Β-Ga2O3 using the gas mixture SF₆/Ar and CH₄/H₂
>
H.
Hiba
BEJI (Nantes)
15:40
•
PSURF1-O3-046
•
Plasma cryogenic processes applied to SiO2 deep etching
>
R.
Remi
DUSSART (Orléans)
|