Plasma surface processing 1
23 September 2025
PSURF
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PSURF 1
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14:45
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15:45
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Plasma surface processing 1
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Ella Fitzgerald room
PSURF
14:45
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PSURF1-O1-075
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Dry etch process development of gapless silicon nitride microlens array for CMOS imager sensors
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A.
Aurélien
TAVERNIER (Grenoble)
15:05
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PSURF1-O2-104
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Development of plasma ALE for Β-Ga2O3 using the gas mixture SF₆/Ar and CH₄/H₂
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H.
Hiba
BEJI (Nantes)
15:25
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PSURF1-O3-046
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Plasma cryogenic processes applied to SiO2 deep etching
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R.
Remi
DUSSART (Orléans)
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