Plasma surface processing 2
23 September 2025
PSURF
•
PSURF 2
•
16:15
>
17:25
•
Plasma surface processing 2
•
Ella Fitzgerald room
PSURF
16:15
•
PSURF2-K1-090
•
Numerical simulations and ion beam experiments for the analyses of surface reactions for reactive ion etching
>
S.
Satoshi
HAMAGUCHI (Osaka)
16:45
•
PSURF2-O1-107
•
Enhancing plasma etching efficiency via physics-based modeling, experimental measurements, machine learning, and optimization algorithms
>
G.
George
KOKKORIS (Athens)
17:05
•
PSURF2-O2-049
•
Formation of black silicon microstructures by the stiger etching process for microfluidic applications
>
A.
Ayoub
RAHALI (Orléans)
|