Plasma surface processing 4
25 September 2025
PSURF
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PSURF 4
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10:35
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12:15
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Plasma surface processing 4
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Ella Fitzgerald room
PSURF
10:35
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PSURF4-O1-001
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Transient signals measurement capability for the analysis of thin films and surfaces reactivity
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P.
Patrick
CHAPON (Palaiseau)
10:55
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PSURF4-O2-105
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Plasma-surface characterization during V2O3 thin films etching in SF6/Ar plasma
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T.
Tatiana Chancelle
MBOUJA SIGNE (Nantes)
11:15
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PSURF4-O3-122
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Sensing enhancement of chemiresistive gas sensors by surface functionalization
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S.
Sang Sub
KIM (Incheon)
11:35
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PSURF4-O4-111
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Defect-engineered V₂O₅/TiO₂ thin films deposited by DC sputtering for improved carbofuran degradation
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D.
Dejan
PJEVIC (Belgrade)
11:55
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PSURF4-O5-026
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Cleaning process of 3D and delicate heterogeneous structures with HDRF®, optimize chemistry with remote plasma, for microelectronics' and medical applications
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M.
Marc
SEGERS (Bernin)
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