Process control (including plasma diagnostics, plasma modelling) - Part 1/3

24 September 2019
Conferences, Oral
PROC PROC1 10:30 > 12:10 Process control (including plasma diagnostics, plasma modelling) - Part 1/3 Ella Fitzgerald Room PROC

10:30 PROC1-O1-142 On three different ways to quantify the degree of ionization in sputtering magnetrons > D. Daniel Lundin (Orsay) 10:50 PROC1-O2-115 Characterization of a distributed antenna array microwave plasma used for low-temperature/large-area nanocrystalline diamond film deposition > D. Damia Dekkar (Villetaneuse) 11:10 PROC1-O3-067 Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge > J. Jaroslav Hnilica (Brno) 11:30 PROC1-O4-050 A remote plasma spectroscopy based method for monitoring of volatile chemicals in a vacuum environment > B. Bimal Kurian (Liverpool) 11:50 PROC1-O5-003 Density of N and H atoms in R/x%(N<sub>2</sub>-5%H<sub>2</sub>) (R = Ar or He) microwave afterglows&nbsp;&nbsp; > A. andre Ricard (Toulouse)

 


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