Process control (including plasma diagnostics, plasma modelling) - Part 1/3
24 September 2019
Conferences, Oral
PROC
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PROC1
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10:30
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12:10
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Process control (including plasma diagnostics, plasma modelling) - Part 1/3
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Ella Fitzgerald Room
PROC
10:30
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PROC1-O1-142
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On three different ways to quantify the degree of ionization in sputtering magnetrons
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D.
Daniel
Lundin
10:50
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PROC1-O2-115
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Characterization of a distributed antenna array microwave plasma used for low-temperature/large-area nanocrystalline diamond film deposition
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D.
Damia
Dekkar
11:10
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PROC1-O3-067
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Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge
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J.
Jaroslav
Hnilica
11:30
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PROC1-O4-050
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A remote plasma spectroscopy based method for monitoring of volatile chemicals in a vacuum environment
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B.
Bimal
Kurian
11:50
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PROC1-O5-003
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Density of N and H atoms in R/x%(N<sub>2</sub>-5%H<sub>2</sub>) (R = Ar or He) microwave afterglows
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A.
andre
Ricard
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