Poster session I & Exhibition Cocktail

• DEPO -P1-011 • Antifogging surfaces prepared from plasma copolymerization > F. Fabienne Poncin-Epaillard • DEPO -P1-034 • A low-temperature (330 &deg;C) deposition of high-performance thermochromic VO₂-based coatings for smart-window applications > T. Tomáš Bárta • DEPO -P1-038 • Growing controllable-crystalline aluminium nitride thin films by plasma-enhanced atomic layer deposition at low temperature and its properties > T. Tai Nguyen • DEPO -P1-040 • The role of atomic oxygen in the growth of single phase &beta;-MnO₂ thin films by remote plasma assisted pulsed laser deposition > M. Malek Tabbal • DEPO -P1-053 • Water stability of organosilicon coatings prepared by atmospheric pressure plane-to-plane dielectric barrier discharge > L. Luc Stafford • DEPO -P1-063 • Influence of the film thickness on the structure, optical and photocatalytic properties of TiO₂ thin films deposited by ICP-PECVD > W. William Ravisy • DEPO -P1-074 • Porous silicon double membranes for lithium- ion batteries > C. Chafiaa Yaddaden • DEPO -P1-108 • Effect of the silicon substrate nitridation on optical and electrical properties of silicon carbonitride thin films deposited by reactive magnetron sputtering > E. Eric Tomasella • DEPO -P1-109 • Hollow cathode plasma sputtering for coating the 90^o elbow vacuum chambers of the ELENA antiproton ring at CERN > A. Antonios Sapountzis • DEPO -P1-128 • Pulsed Electron Cyclotron Wave Resonance Plasma Enhanced Chemical Vapour Deposition of photocatalytic TiO2 thin films on polymeric substrates > B. Benjamin Dey • DEPO -P1-145 • Time resolved In situ characterization of deposited SiCN:H thin films obtained in Ar/TMS/N2 dual ECR and RF-PVD by infrared absorption spectroscopy (FTIR) > Z. Ziad Al Hallak • DEPO-P1-171 • Oblique deposition of nickel thin films by HiPIMS > H. Hamidreza Hajihoseini • DEPO-P1-181 • Organosilicon coatings deposited by cold nitrogen plasma post-discharge for prevention of biofilm formation in food and medical sectors > C. Charafeddine JAMA • GROM -P1-010 • CrN thin film synthesis in Ar/N2 and Ar/NH3, a comparative study > E. Emile Haye • GROM -P1-044 • Reactivity to organic vapors at PECVD PDMS-like surfaces for gas detection and membrane separation > G. Ghadi Dakroub • GROM -P1-083 • Prediction of the column tilt angle in GLAD by sputtering > A. Aurélien Besnard • GROM -P1-084 • Low pressure plasma polymerization of&nbsp; cylclopropylamine in a hollow cathode reactor > S. Stephane Lucas • GROM -P1-086 • PVD large scale growth simulation: Influence of the substrate roughness > A. Aurélien Besnard • GROM -P1-098 • Preparation of DLC films by microwave plasma-assisted chemical vapour deposition in open-air > H. Hidetsugu Yagi • GROM -P1-114 • Bio-inspired functional coatings on plasma-processed polymeric materials for vehicular interiors > H. Hernando III Salapare • HELI -P1-085 • Surface functionalisation, nanoroughness and drug delivery by atmospheric plasma jet on scaffolds > A. Alessandro Patelli • INDU -P1-020 • Titanium nitrides coating for hard chromium replacement > M. Marjorie Cavarroc • INDU -P1-136 • Atom Probe Tomography Analysis for Additive Manufacturing > A. Anna BUI • INDU-P1-188 • From Component to System for a Faster Technology > A. Andreea Vasiliu • LIQU -P1-049 • Study of the synthesis of nanoparticles in liquid phase enhanced by microsecond plasma discharges at atmospheric pressure > S. Stephane Cuynet • SURF -P1-043 • Physicochemical modification of spin-coated TiO2 nanoparticle thin film by ICP low pressure oxygen plasma > M. Maria Mitronika • SURF -P1-051 • Functionalization and characterization study of Metal Organic Frameworks (MOF) by plasma process > A. Aymane Najah • SURF -P1-055 • The role of SiF4 physisorption in silicon cryoetching > T. Thomas Tillocher • SURF -P1-082 • Measuring the energy flux at the substrate during plasma based deposition techniques: a way to investigate both the sputtering process and the film growth > A-L. Anne-Lise Thomann • SURF -P1-146 • Study of interactions between a PMMA support and cold plasma used for thin film deposition. > M. Mohamed Mounder Kouicem • SURF -P1-148 • Etching of Ge-Sb-Se glasses in SF₆ and SF₆/Ar plasma > T. thibaut Meyer • SURF -P1-150 • Physicochemical modification of spin-coated silver nanoparticle thin film by atmospheric surface-wave microwave post-discharge > L. Luc Stafford • SURF -P1-159 • Patterning at micrometric scale of metallic surfaces by plasma etching > F. feriel Laourine • TRIB -P1-015 • Optimization of Mo-S-N solid lubricant films with improved adhesion and low friction by DC magnetron sputtering. > K. Kaushik Hebbar Kannur • TRIB -P1-030 • CHARACTERIZATION OF DUPLEX, NANOCOMPOSITE&nbsp;AND NANOLAYERED THIN FILMS > B. Branko Skoric • TRIB -P1-068 • Study of Cr, CrN, CrAlN monolayers and Cr/CrN/CrAlN multilayers developed by DC magnetron sputtering for mechanical application > C. Corinne Nouveau • TRIB -P1-080 • Tribological behavior of ZrN/Ta Coatings Deposited by RF Magnetron Sputtering on Ti-6Al-4V and CoCrMo Alloys > C. Corinne Nouveau • TRIB -P1-103 • <strong><em>Reactive HiPIMS deposition of Ti-Al-N: Influencing the Cubic to Wurtzite phase transition</em></strong> > L. Lukas Zauner