Plasma - deposited coatings for optical, electronical and other functionalities - Part 4/5

25 September 2019
Conferences, Keynote & oral
DEPO DEPO4 16:10 > 18:00 Plasma - deposited coatings for optical, electronical and other functionalities - Part 4/5 Antipolis Auditorium DEPO

16:10 DEPO4-K1-039 Influence of nitrogen incorporation on physical and electrical properties of a-C:H films deposited by a plasma beam source > M. Martin Fenker (Schwäbisch Gmünd) 16:40 DEPO4-O2-022 Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated CVD > D. Dominique Abessolo Ondo (Belvaux) 17:00 DEPO4-O3-096 iCVD pore filling: a way to limit plasma damage during porous low-k integration > V. Vincent Jousseaume (Grenoble) 17:20 DEPO4-O4-166 High performance hard magnetic Nd<sub>2</sub>Fe<sub>14</sub>B thin films by pulsed laser deposition > T. Tuan Nguyen Van (Limoges) 17:40 DEPO4-O5-168 Elaboration and Thermoelectric Properties of CuCrO2:Mg and CuFeO2:Mg Thin Films Deposited by RF Sputtering > L. Lionel Presmanes (Toulouse)

 


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