Plasma - deposited coatings for optical, electronical and other functionalities - Part 4/5

25 September 2019
Conferences, Keynote & oral
DEPO • DEPO4 • 16:10 > 18:00 • Plasma - deposited coatings for optical, electronical and other functionalities - Part 4/5 • Antipolis Auditorium DEPO

16:10 • DEPO4-K1-039 • Influence of nitrogen incorporation on physical and electrical properties of a-C:H films deposited by a plasma beam source > M. Martin Fenker 16:40 • DEPO4-O2-022 • Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated CVD > D. Dominique Abessolo Ondo 17:00 • DEPO4-O3-096 • iCVD pore filling: a way to limit plasma damage during porous low-k integration > V. Vincent Jousseaume 17:20 • DEPO4-O4-166 • High performance hard magnetic Nd<sub>2</sub>Fe<sub>14</sub>B thin films by pulsed laser deposition > T. Tuan Nguyen Van 17:40 • DEPO4-O5-168 • Elaboration and Thermoelectric Properties of CuCrO2:Mg and CuFeO2:Mg Thin Films Deposited by RF Sputtering > L. Lionel Presmanes

 


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